Overview

• Chemical Name: 3-Hydroxytetrahydro-2,6-methanofuro[3,2-b]furan-5(2H)-one
• CAS Number: 90129-15-0
• Molecular Formula: C6H8O4
• Molecular Weight: 144.13 g/mol
• Structure Type: Bicyclic furanone with a hydroxyl functional group
• Physical State: Solid at room temperature
• Solubility: Soluble in polar organic solvents, moderately soluble in water

Properties

1. Functional Groups: Contains both a hydroxyl (-OH) group and a lactone (cyclic ester) moiety. These groups impart reactivity in esterification, polymerization, and nucleophilic substitution reactions.
2. Stability: Stable under normal temperature and pressure; sensitive to strong acids and bases which can hydrolyze the lactone ring.
3. Reactivity: The hydroxyl group allows for derivatization, while the bicyclic lactone system can participate in cross-linking reactions, useful in polymeric matrices.
4. Melting Point: Approximately 120–125 °C

Applications

Photoresist Formulation:
This compound is primarily utilized as a functional additive in advanced photoresist materials due to its reactive hydroxyl and lactone groups. These allow for controlled cross-linking during photolithography processes, improving the resolution and thermal stability of resist films.

• Adhesion Promotion:
  The hydroxyl functionality enhances adhesion of photoresist layers to silicon wafers and other substrates, critical for minimizing pattern defects in microfabrication.
• Polymer Precursors:
  Acts as a monomer or cross-linker in specialty polymers used in semiconductor fabrication. Its bicyclic lactone structure contributes to rigidity and dimensional stability in thin film coatings.
• Electronic Chemicals:
  Serves as a building block for chemical intermediates in the production of high-performance electronic-grade polymers and coatings.

Industrial Advantages

1. High Purity: Available in electronic-grade purity suitable for semiconductor fabrication.
2. Chemical Versatility: Can undergo selective modifications to tune solubility, reactivity, and polymerization characteristics.
3. Thermal and Mechanical Stability: Ensures consistent performance in high-precision lithographic applications.
4. Low Volatility: Reduces contamination risk in cleanroom environments.

Handling and Safety

• Handling: Use in a well-ventilated environment; avoid inhalation and skin contact.
• Storage: Store in airtight containers away from strong acids and bases.
• Regulatory Considerations: Compliance with electronic chemical purity standards is essential.

Summary

3-Hydroxytetrahydro-2,6-methanofuro[3,2-b]furan-5(2H)-one is a specialized bicyclic lactone widely applied in the semiconductor and photoresist industries. Its unique combination of hydroxyl and lactone functionalities provides chemical reactivity that improves photoresist performance, substrate adhesion, and polymer stability, making it a key electronic-grade chemical in high-precision microfabrication processes.

Product:90129-15-0, Semiconductor Photoresist, Electronic Chemicals