Industrial Applications

This compound is primarily utilized in the semiconductor and photoresist industry due to its unique combination of polymerizable and structurally rigid moieties. Key applications include:

1. Photoresist Monomers:
   • The vinyl group enables incorporation into polymer matrices used for advanced photoresists.
   • Its bicyclic oxathiolane structure provides high etch resistance and dimensional stability, critical for next-generation lithography (ArF/DUV).
2. Electronic Chemicals:
   • Serves as a specialty monomer in formulations for electronic-grade coatings.
   • Enhances mechanical and thermal properties of polymers, allowing them to withstand semiconductor fabrication processes.
3. Polymer Engineering:
   • Enables the design of high-performance copolymers with tailored solubility and etch resistance.
   • Useful in creating resist layers with precise pattern fidelity at nanoscale resolution.

Summary

2-Propenoic acid, 2-methyl-, 2-[(hexahydro-2,2-dioxido-3,5-methanocyclopent[d]-1,2-oxathiol-6-yl)oxy]-2-oxoethyl ester (CAS 1135824-87-1) is a high-performance methacrylate derivative used primarily in the photoresist and semiconductor industry. Its combination of polymerizable functionality, thermal stability, and rigid bicyclic heterocycle makes it an ideal monomer for advanced electronic materials where precision, etch resistance, and thermal durability are essential.

Product:1135824-87-1, Semiconductor Photoresist, Electronic Chemicals