Overview
2-[2-(6-Hydroxy-1,3-benzodioxol-5-yl)-2H-benzotriazol-5-yl]ethyl 2-methyl-2-propenoate (CAS No. 1357398-04-9) is a specialty organic compound associated with advanced electronic materials and semiconductor processing applications. Based on its molecular architecture, the compound belongs to the class of benzotriazole-functionalized aromatic acrylates/methacrylates, incorporating both a benzodioxole aromatic system and a polymerizable methacrylate functionality.
The structure strongly suggests its use as a functional additive, ultraviolet (UV)-responsive material, or polymerizable intermediate in the formulation of high-performance photoresists and electronic chemicals used in microfabrication processes.
Chemical Identity
| Property | Description |
| Chemical Name | 2-[2-(6-Hydroxy-1,3-benzodioxol-5-yl)-2H-benzotriazol-5-yl]ethyl 2-methyl-2-propenoate |
| CAS Number | 1357398-04-9 |
| Chemical Class | Benzotriazole derivative / Methacrylate-functional electronic material |
| Functional Groups | Benzotriazole, phenolic hydroxyl, benzodioxole ring, methacrylate ester |
| Typical Application Area | Semiconductor materials, photoresist chemistry, electronic chemicals |
Structural and Chemical Characteristics
This compound contains several chemically significant functional domains:
- Benzotriazole Moiety
The benzotriazole group is widely utilized in advanced materials chemistry because of its:
- Strong UV absorption capability
- Photochemical stability
- Electron-accepting characteristics
- Thermal durability
In electronic materials, benzotriazole derivatives are frequently incorporated into:
- UV-sensitive polymers
- Photoactive systems
- Surface modification agents
- Stabilizers for lithographic materials
- Methacrylate Functional Group
The presence of a 2-methyl-2-propenoate (methacrylate) group indicates that the compound is polymerizable through free-radical mechanisms.
This functionality is important in:
- Photoresist resin crosslinking
- UV-curable coatings
- Thin-film polymer systems
- Chemically amplified resist platforms
Methacrylate-containing materials are commonly selected in semiconductor processing because they offer:
- High film-forming ability
- Tunable dissolution behavior
- Good lithographic resolution
- Compatibility with photopolymerization systems
- Benzodioxole Aromatic Segment
The benzodioxole ring contributes:
- Aromatic rigidity
- Electronic delocalization
- Optical absorption tuning
- Enhanced molecular stability
Such aromatic systems are frequently employed in specialty electronic materials requiring controlled optical and photochemical behavior.
Role in Semiconductor and Photoresist Industries
Photoresist Material Development
The molecular design suggests that this compound may function as:
- A polymerizable UV-absorbing monomer
- A functional additive for resist formulations
- A specialty acrylate intermediate
- A photochemical performance modifier
In semiconductor lithography, compounds with benzotriazole chromophores are often investigated for:
- Deep ultraviolet (DUV) resist systems
- Anti-reflective performance enhancement
- Photo-patternable polymer formulations
- Radiation-sensitive coatings
The methacrylate functionality further supports compatibility with:
- Radical polymerization
- UV-curing chemistry
- Crosslinked resist matrices
Electronic Chemical Applications
- Advanced Lithographic Materials
The compound may be utilized in research or specialty formulations for:
- Semiconductor wafer patterning
- Microelectronic fabrication
- Thin-film imaging systems
- High-resolution resist technologies
- UV-Responsive Polymer Systems
Because benzotriazole derivatives exhibit characteristic UV absorption behavior, the compound may contribute to:
- Optical filtering behavior
- Controlled photoreactivity
- Photo-stabilization mechanisms
- Exposure wavelength tuning
- Functional Coatings
Methacrylate-functional aromatic compounds are frequently evaluated for:
- Electronic protective coatings
- UV-curable films
- Specialty optical layers
- High-performance polymer coatings
Industrial Importance
In modern semiconductor manufacturing, material requirements include:
- Extremely high purity
- Low metal-ion contamination
- Controlled photochemical response
- Excellent thermal stability
- Compatibility with nanoscale lithography
Compounds of this type are therefore relevant to:
- Advanced packaging technologies
- Integrated circuit fabrication
- Electronic-grade polymer synthesis
- Specialty resist additive development
The integration of UV-active aromatic groups with polymerizable methacrylate chemistry is particularly valuable in the design of next-generation lithographic materials.
Handling and Storage Considerations
As with many methacrylate-functional specialty chemicals, typical industrial handling practices generally include:
- Storage away from heat and UV exposure
- Protection from moisture and oxidizing agents
- Use under controlled temperature conditions
- Prevention of unintended polymerization
Electronic-grade materials are commonly handled under:
- Cleanroom-compatible conditions
- Nitrogen or inert atmosphere systems
- High-purity process controls
Users should consult official Safety Data Sheets (SDS) and technical specifications from qualified suppliers before industrial use.
Conclusion
2-[2-(6-Hydroxy-1,3-benzodioxol-5-yl)-2H-benzotriazol-5-yl]ethyl 2-methyl-2-propenoate (CAS No. 1357398-04-9) is a specialized benzotriazole-containing methacrylate compound relevant to semiconductor and electronic chemical applications. Its structural combination of a UV-responsive benzotriazole system and a polymerizable methacrylate group makes it potentially useful in advanced photoresist technologies, UV-curable electronic materials, and lithographic polymer systems.
Product:1357398-04-9, Semiconductor Photoresist, Electronic Chemicals

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